FDPEngineeringOffline

AICTE ATAL Faculty Development Programme on "Next-Generation Semiconductor Devices: From FinFET to Advanced nsFET Design and Applications"

A one-week ATAL Academy FDP on modern transistor technologies for VLSI systems, covering the evolution from CMOS to FinFET and nanosheet FET (nsFET/GAAFET) architectures, device design, performance analysis, fabrication trends and applications.

At a glance

Type
FDP
Mode
Offline
Dates
14–19 Dec 2026 (6 calendar days)
Fee
Free
Next deadline
Registration: 10 Dec 2026
Who can attend
Faculty members from AICTE-approved institutions in Engineering, Technology, and allied disciplines (Assistant Professors, Associate Professors, Professors, academic administrators); postgraduate students, Ph.D. scholars and research scholars in relevant domains.
Eligibility
Participants should be nominated/recommended by their respective Head of Institution as per ATAL guidelines. Register on https://atalacademy.aicte-india.org/, then fill the Google Form https://forms.gle/1Pk9MbXe2KgBDJmm6. Selected candidates will get notification: 12-12-2026 (via email).
Venue
CSMSS Chh. Shahu College of Engineering, Kanchanwadi, Paithan Road, Chhatrapati Sambhajinagar (Aurangabad), MS, India - 431011

Fee structure

CategoryFee
All participantsFree ("Registration is free")

Important dates

  • Registration closes10 Dec 2026

Contact

email

Thrust areas

Transition from CMOS to FinFET and nanosheet FET (nsFET/GAAFET)Device design and modelingPerformance analysisFabrication trends and processesVLSI design and semiconductor applications

Checked against the organiser's official page or brochure · listed 27 Oct 2026

Browse: Maharashtra · Electronics and Communication · Engineering FDPs · Free events · December 2026 · All topics

← All events